Evaluation of lithography simulation model accuracy for hotspot-based mask quality assurance
- 著者名:
- M. Satake ( Toshiba Corp. (Japan) )
- M. Kariya ( Toshiba Corp. (Japan) )
- S. Tanaka ( Toshiba Corp. (Japan) )
- K. Hashimoto ( Toshiba Corp. (Japan) )
- S. Inoue ( Toshiba Corp. (Japan) )
- 掲載資料名:
- Photomask and next-generation lithography mask technology XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6607
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819467454 [0819467456]
- 言語:
- 英語
- 請求記号:
- P63600/6607
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
国際会議録
Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |