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Cost-effective pattern inspection system using Xe-Hg lamp in challenge of sub-65-nm node

著者名:
  • W. S. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
  • J. H. Park ( Samsung Electronics Co., Ltd. (South Korea) )
  • D. -H. Chung ( Samsung Electronics Co., Ltd. (South Korea) )
  • S. -G. Woo ( Samsung Electronics Co., Ltd. (South Korea) )
掲載資料名:
Photomask and next-generation lithography mask technology XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6607
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
言語:
英語
請求記号:
P63600/6607
資料種別:
国際会議録

類似資料:

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