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Layout and EB data reduction: comparison of OASIS based approach with format-specific reversible compressions

著者名:
  • R. Pai ( SoftJin Technologies Pvt. Ltd. (India) )
  • M. Pereira ( SoftJin Technologies Pvt. Ltd. (India) )
  • C. S. Manu ( SoftJin Technologies Pvt. Ltd. (India) )
  • A. Parchuri ( SoftJin Technologies Pvt. Ltd. (India) )
  • B. Baruah ( SoftJin Technologies Pvt. Ltd. (India) )
掲載資料名:
Photomask and next-generation lithography mask technology XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6607
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
言語:
英語
請求記号:
P63600/6607
資料種別:
国際会議録

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