Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Scatterometry based profile metrology of two-dimensional patterns of EUV masks

著者名:

I. Pundaleva ( Samsung Electronics Co., Ltd. (South Korea) )
R. Chalykh ( Samsung Electronics Co., Ltd. (South Korea) )
H. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
B. Kim ( Samsung Electronics Co., Ltd. (South Korea) )
H. Cho ( Samsung Electronics Co., Ltd. (South Korea) )

掲載資料名:

Photomask and next-generation lithography mask technology XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6607

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

言語:

英語

請求記号:

P63600/6607

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046914
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2007 : 14th
会議開催地:	Yokohama, Japan
会議開催年:	2007.04.17-2007.04.19

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