Progress on EUV mask fabrication for 32-nm technology node and beyond

Progress on EUV mask fabrication for 32-nm technology node and beyond

著者名:

G. Zhang ( Intel Corp. (USA) )

P. -Y. Yan ( Intel Corp. (USA) )

T. Liang ( Intel Corp. (USA) )

S. Park ( Intel Corp. (USA) )

P. Sanchez ( Intel Corp. (USA) )

E. Y. Shu ( Intel Corp. (USA) )

E. A. Ultanir ( Intel Corp. (USA) )

S. Henrichs ( Intel Corp. (USA) )

A. Stivers ( Intel Corp. (USA) )

G. Vandentop ( Intel Corp. (USA) )

B. Lieberman ( Intel Corp. (USA) )

P. Qu ( Intel Corp. (USA) )

さらに 7 件

掲載資料名:

Photomask and next-generation lithography mask technology XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6607

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

言語:

英語

請求記号:

P63600/6607

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046914
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2007 : 14th
会議開催地:	Yokohama, Japan
会議開催年:	2007.04.17-2007.04.19

類似資料:

1 国際会議録 EUV mask process development and integration [6283-91] Zhang, G., Yan, -Y. P., Liang, T., Du, Y., Sanchez, P., Park, S., Lanzendorf, J. E., Choi, J. C., Shu, Y. E., Stivers, … SPIE - The International Society of Optical Engineering	7 国際会議録 EUV mask patterning approaches Yan,P., Zhang,G., Kofron,P., Chow,J., Stivers,A.R., Tejnil,E., Cardinale,G.F., Kearney,P.A. SPIE - The International Society for Optical Engineering
2 国際会議録 EUV mask pattern defect printability [6283-95] Liang, T., Zhang, G., Naulleau, P., Myers, A., Park, -J. S., Stivers, A., Vandentop, G. SPIE - The International Society of Optical Engineering	8 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering
3 国際会議録 EUV mask pilot line at Intel Corporation (Keynote Address) Stivers, A. R., Yan, P. -Y., Zhang, G., Shu, E. Y., Tejnil, E., Lieberman, B., Nagpal, R., Hsia, K., Penn, M., Lo, F. … SPIE - The International Society of Optical Engineering	9 国際会議録 TaN EUVL mask fabrication and characterization Yan,P.-Y., Zhang,G., Ma,A., Liang,T. SPIE-The International Society for Optical Engineering
4 国際会議録 EUV mask absorber characterization and selection Yan,P., Zhang,G., Kofron,P., Powers,J.E., Tran,M., Liang,T., Stivers,A.R., Lo,F.-C. SPIE - The International Society for Optical Engineering	10 国際会議録 Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond Chou, S.-Y., Shin, J.-J., Shu, K.-C., You, J.-W., Shiu, L.-H., Chang, B.-C., Gau, T.-S., Lin, B.J. SPIE - The International Society of Optical Engineering
5 国際会議録 Enhanced optical inspectability of patterned EUVL mask Liang,T., Stivers,A., Yan,P.-Y., Tejnil,E., Zhang,G. SPIE-The International Society for Optical Engineering	11 国際会議録 EUV mask fabrication with Cr absorber Mangnat,P.J., Hector,S.D., Rose,S., Cardinale,G.F., Tenjil,E., Stivers,A.R. SPIE - The International Society for Optical Engineering
6 国際会議録 EUVL defect printability at the 32-nm node Gullikson, E.M., Tejnil, E., Liang, T., Stivers, A.R. SPIE - The International Society of Optical Engineering	12 国際会議録 Mask technology for EUV lithography Bujak,M., Burkhart,S.C., Cerjan,C.J., Kearney,P.A., Moore,C.E., Prisbrey,S., Sweeney,D.W., Tong,W.M., Vernon,S.P., … SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12