Full field EUV lithography turning into a reality at IMEC
- 著者名:
R. Jonckheere ( IMEC (Belgium) ) G. F. Lorusso ( IMEC (Belgium) ) A. M. Goethals ( IMEC (Belgium) ) J. Hermans ( IMEC (Belgium) ) B. Baudemprez ( IMEC (Belgium) ) A. Myers ( IMEC (Belgium) ) I. Kim ( IMEC (Belgium) ) A. Niroomand ( IMEC (Belgium) ) F. Iwamoto ( IMEC (Belgium) ) N. Stepanenko ( IMEC (Belgium) ) K. Ronse ( IMEC (Belgium) ) - 掲載資料名:
- Photomask and next-generation lithography mask technology XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6607
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819467454 [0819467456]
- 言語:
- 英語
- 請求記号:
- P63600/6607
- 資料種別:
- 国際会議録
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