Improvement of etching selectivity for 32-nm node mask making
- 著者名:
C. L. Lu ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) L. Y. Hsia ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) T. H. Cheng ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) S. C. Chang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) W. C. Wang ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) H. J. Lee ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Y. C. Ku ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - 掲載資料名:
- Photomask and next-generation lithography mask technology XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6607
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819467454 [0819467456]
- 言語:
- 英語
- 請求記号:
- P63600/6607
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Application of Sigma7500 pattern generator to X architecture and 45-nm generation mask making
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |