Uniformity studies of inductively coupled plasma etching in fabrication of HgCdTe detector arrays

Uniformity studies of inductively coupled plasma etching in fabrication of HgCdTe detector arrays

著者名:

R. Bommena ( EPIR Technologies, Inc. (USA) )

S. Velicu ( EPIR Technologies, Inc. (USA) )

P. Boieriu ( EPIR Technologies, Inc. (USA) )

T. S. Lee ( EPIR Technologies, Inc. (USA) )

C. H. Grein ( EPIR Technologies, Inc. (USA) )

K. K. Tedjojuwono ( NASA Langley Research Ctr. (USA) )

さらに 1 件

掲載資料名:

Infrared technology and applications XXXIII : 9-13 April 2007, Orlando, Florida, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6542

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466648 [0819466646]

言語:

英語

請求記号:

P63600/6542

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046849
シリーズID:	PA00000029
会議名:	Defense, Security, and Sensing : Infrared Technology and Applications
回次:	2007 : 33rd
会議開催地:	Orlando, Florida, USA
会議開催年:	2007.04.09-2007.04.13

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