An empirical approach adressing the transfer of mask placement errors during exposure

An empirical approach adressing the transfer of mask placement errors during exposure

著者名:

B. Alles ( Univ. of Technology Munich (Germany) )

B. Simeon ( Univ. of Technology Munich (Germany) )

E. Cotte ( Advanced Mask Technology Ctr. (Germany) )

T. Wandel ( Advanced Mask Technology Ctr. (Germany) )

B. Schulz ( AMD Saxony LLC (Germany) )

R. Seltmann ( AMD Saxony LLC (Germany) )

さらに 1 件

掲載資料名:

EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6533

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466556 [0819466557]

言語:

英語

請求記号:

P63600/6533

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046840
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference
回次:	2007 : 23rd
会議開催地:	Grenoble, France
会議開催年:	2007.01.22-2007.01.25

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