Blank Cover Image

Calibration of CD mask standards for the 65-nm node: CoG and MoSi

著者名:
J. Richter ( Advanced Mask Technology Ctr. (Germany) )
T. Heins ( Advanced Mask Technology Ctr. (Germany) )
R. Liebe ( Advanced Mask Technology Ctr. (Germany) )
B. Bodermann ( Physikalisch-Technische Bundesanstalt (Germany) )
A. Diener ( Physikalisch-Technische Bundesanstalt (Germany) )
D. Bergmann ( Physikalisch-Technische Bundesanstalt (Germany) )
C. G. Frase ( Physikalisch-Technische Bundesanstalt (Germany) )
H. Bosse ( Physikalisch-Technische Bundesanstalt (Germany) )
さらに 3 件
掲載資料名:
EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6533
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466556 [0819466557]
言語:
英語
請求記号:
P63600/6533
資料種別:
国際会議録

類似資料:

1 国際会議録 Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask [6281-16]

Gans, F., Liebe, R., Heins, Th., Richter, J., Hasler-Grohne, W., Frase, G. C., Bodermann, B., Czerkas, S., Dirscherl, …

SPIE - The International Society of Optical Engineering
7 国際会議録 Theoretical modelling and experimental verification of the influence of Cr edge profiles on microscopic-optical edge signals for COG masks [6349-191]

Ehret, G., Bodermann, B., Bergmann, D., Diener, A., Haβler-Grohne, W.

SPIE - The International Society of Optical Engineering
2 国際会議録 Results of a round robin measurement on a new CD mask standard

Gans, F., Liebe, R., Richter, J., Schatz, Th., Hauffe, B., Hillmann, F., Dobereiner, S., Bruck, H.-J., Scheuring, G., …

SPIE - The International Society of Optical Engineering
8 国際会議録 Comparison of linewidth measurements on COG masks

Bosse,H., Mirande,W., Frase,C.G., Bruck,H.-J., Lehnigk,S.

SPIE-The International Society for Optical Engineering
3 国際会議録 Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node

W. Häßler-Grohne, C. G. Frase, D. Gnieser, H. Bosse, J. Richter

Society of Photo-optical Instrumentation Engineers
9 国際会議録 Measurement tool influence on CD results on photolithographic masks [6283-113]

Richter, J., Liebe, R., Laske, F., Rudolf, J., Heins, T.

SPIE - The International Society of Optical Engineering
4 国際会議録 Calibration procedures and application of the PTB photomask CD standard [5992-159]

Haβler-Grohne, W., Frase, C. G., Czerkas, S., Dirscherl, K., Bodermann, B., Mirande, W., Ehret, G., Bosse, H.

SPIE - The International Society of Optical Engineering
10 国際会議録 Comparative scatterometric CD and edge profile measurements on a MoSi mask using different scatterometers

M. Wurm, A. Diener, B. Bodermann

Society of Photo-optical Instrumentation Engineers
5 国際会議録 Characterization of new CD photomask standards

Mirande, W., Bodermann, B., Haessler-Grohne, W., Frase, C.G., Czerkas, S., Bosse, H.

SPIE - The International Society of Optical Engineering
11 国際会議録 Comparative scatterometric CD measurements on a MoSi photo mask using different metrology tools

J. Richter, J. Rudolf, B. Bodermann, J. C. Lam

Society of Photo-optical Instrumentation Engineers
6 国際会議録 Metrological characterization of new CD photomask standards

Mirande, W., Bodermann, B., Haβler-Grohne, W., Frase, C. G., Czerkas, S., Bosse, H.

SPIE - The International Society of Optical Engineering
12 国際会議録 Line edge roughness on photo lithographic masks [6152-62]

Heins, T., Dersch, U., Liebe, R., Richter, J.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12