OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

著者名:

F. Sundermann ( STMicroelectronics (France) )

Y. Trouiller ( LETI-CEA (France) )

J. Urbani ( STMicroelectronics (France) )

C. Couderc ( NXP Semiconductors (France) )

J. Belledent ( NXP Semiconductors (France) )

A. Borjon ( NXP Semiconductors (France) )

F. Foussadier ( STMicroelectronics (France) )

C. Gardin ( Freescale Semiconductor, Inc. (France) )

L. LeCam ( NXP Semiconductors (France) )

Y. Rody ( NXP Semiconductors (France) )

M. Saied ( Freescale Semiconductor, Inc. (France) )

E. Yesilada ( Freescale Semiconductor, Inc. (France) )

C. Martinelli ( STMicroelectronics (France) )

B. Wilkinson ( Freescale Semiconductor, Inc. (France) )

F. Vautrin ( STMicroelectronics (France) )

N. Morgana ( Freescale Semiconductor, Inc. (France) )

F. Robert ( STMicroelectronics (France) )

P. Montgomery ( Freescale Semiconductor, Inc. (France) )

G. Kerrien ( STMicroelectronics (France) )

J. Planchot ( STMicroelectronics (France) )

V. Farys ( STMicroelectronics (France) )

J. D. Maria ( LETI-CEA (France) )

さらに 17 件

掲載資料名:

EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6533

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466556 [0819466557]

言語:

英語

請求記号:

P63600/6533

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046840
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference
回次:	2007 : 23rd
会議開催地:	Grenoble, France
会議開催年:	2007.01.22-2007.01.25

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