Investigation on immersion defectivity root cause

Investigation on immersion defectivity root cause

著者名:

V. Farys ( STMicroelectronics (France) )

S. Gaugiran ( CEA-Leti-Minatec (France) )

D. Cruau ( Freescale Semiconductor, Inc. (France) )

K. Mestadi ( STMicroelectronics (France) )

S. Warrick ( Freescale Semiconductor, Inc. (France) )

M. Benndorf ( NXP Semiconductors (France) )

R. Feilleux ( CEA-Leti-Minatec (France) )

C. Sourd ( CEA-Leti-Minatec (France) )

さらに 3 件

掲載資料名:

EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6533

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466556 [0819466557]

言語:

英語

請求記号:

P63600/6533

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046840
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference
回次:	2007 : 23rd
会議開催地:	Grenoble, France
会議開催年:	2007.01.22-2007.01.25

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1 国際会議録 Integrating immersion lithography in 45-nm logic manufacturing M. Benndorf, S. Warrick, W. Conley, D. Cruau, D. DeSimone, K. Mestadi, V. Farys, J. Gemmink SPIE - The International Society of Optical Engineering	7 国際会議録 Resist component leaching in 193-nm immersion lithography Chapon, J.-D., Chaton, C., Gouraud, P., Broekaart, M., Warrick, S., Guilmeau, I., Trauiller, Y., Belledent, J. SPIE - The International Society of Optical Engineering
2 国際会議録 Extending immersion lithography to the 32-nm node S. Warrick, W. Conley, V. Farys, M. Benndorf, J. Gemmink, Y. Trouiller, J. Belledent, D. Jovanovic, P. Gouraud SPIE - The International Society of Optical Engineering	8 国際会議録 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner Y. Trouiller, V. Farys, A. Borjon, J. Belledent, C. Couderc, F. Sundermann, J. Urbani, Y. Rody, C. Gardin, J. Planchot, … SPIE - The International Society of Optical Engineering
3 国際会議録 Immersion lithography robustness for the C065 node [6154-07] Warrick, S., Morton, R., Mauri, A., Chapon, J. D, Belledent, J., Conley, W., Barr, A., Lucas, K., Monget, C., Plantier, … SPIE - The International Society of Optical Engineering	9 国際会議録 Optical issues of thin organic pellicles in 45-nm and 32-nm immersion lithography [6349-20] Lucas, K., Gordon, J. S., Conley, W., Saied, M., Warrick, S., Pochkowski, M., Smith, M. D., West, C., Kalk, F., Kuijten, … SPIE - The International Society of Optical Engineering
4 国際会議録 ARC stack development for hyper-NA imaging V. Farys, S. Warrick, C. Chaton, J. Chapon SPIE - The International Society of Optical Engineering	10 国際会議録 Immersion defectivity study with volume production immersion lithography tool K. Nakano, H. Kato, T. Fujiwara, K. Shiraishi, Y. Iriuchijima, S. Owa, I. Malik, S. Woodman, P. Terala, C. Pelissier, H. … SPIE - The International Society of Optical Engineering
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6 国際会議録 A methodology for the characterization of topography induced immersion bubble defects Warrick, S., Hinnen, P., Morton, R., Cooper, K., Sassoulas, P.-O., Depre, J., Navarro, R., van Haren, R., Browning, C., … SPIE - The International Society of Optical Engineering	12 国際会議録 Immersion defectivity control by optimizing immersion materials and processes K. Nakano, H. Kato, S. Owa SPIE - The International Society of Optical Engineering

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