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Double pattern EDA solutions for 32nm HP and beyond

著者名:
G. E. Bailey ( Mentor Graphics Corp. (USA) )
A. Tritchkov ( Mentor Graphics Corp. (USA) )
J. Park ( Mentor Graphics Corp. (USA) )
L. Hong ( Mentor Graphics Corp. (USA) )
V. Wiaux ( IMEC (Belgium) )
E. Hendrickx ( IMEC (Belgium) )
S. Verhaegen ( IMEC (Belgium) )
P. Xie ( Mentor Graphics Corp. (USA) )
J. Versluijs ( IMEC (Belgium) )
さらに 4 件
掲載資料名:
Design for manufacturability through design-process integration
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6521
発行年:
2007
巻:
6521
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466402 [0819466409]
言語:
英語
請求記号:
P63600/6521
資料種別:
国際会議録

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