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Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node

著者名:
A. Nackaerts ( IMEC (Belgium) )
S. Verhaegen ( IMEC (Belgium) )
M. Dusa ( ASML Netherlands B.V. (Netherlands) )
H. Kattouw ( ASML Netherlands B.V. (Netherlands) )
F. van Bilsen ( ASML Netherlands B.V. (Netherlands) )
S. Biesemans ( IMEC (Belgium) )
G. Vandenberghe ( IMEC (Belgium) )
さらに 2 件
掲載資料名:
Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6521
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466402 [0819466409]
言語:
英語
請求記号:
P63600/6521
資料種別:
国際会議録

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