Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node
- 著者名:
A. Nackaerts ( IMEC (Belgium) ) S. Verhaegen ( IMEC (Belgium) ) M. Dusa ( ASML Netherlands B.V. (Netherlands) ) H. Kattouw ( ASML Netherlands B.V. (Netherlands) ) F. van Bilsen ( ASML Netherlands B.V. (Netherlands) ) S. Biesemans ( IMEC (Belgium) ) G. Vandenberghe ( IMEC (Belgium) ) - 掲載資料名:
- Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6521
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466402 [0819466409]
- 言語:
- 英語
- 請求記号:
- P63600/6521
- 資料種別:
- 国際会議録
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