Double patterning design split implementation and validation for the 32nm node
- 著者名:
- M. Drapeau ( Synopsys, Inc. (Canada) )
- V. Wiaux ( IMEC (Belgium) )
- E. Hendrickx ( IMEC (Belgium) )
- S. Verhaegen ( IMEC (Belgium) )
- T. Machida ( Renesas Technology Corp. (Japan) )
- 掲載資料名:
- Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6521
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466402 [0819466409]
- 言語:
- 英語
- 請求記号:
- P63600/6521
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |