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Double patterning with multilayer hard mask shrinkage for sub-0.25 k1 lithography

著者名:
H. J. Liu ( Nanya Technology Corp. (Taiwan) )
W. H. Hsieh ( Nanya Technology Corp. (Taiwan) )
C. H. Yeh ( Nanya Technology Corp. (Taiwan) )
J. S. Wu ( Nanya Technology Corp. (Taiwan) )
H. W. Chan ( Nanya Technology Corp. (Taiwan) )
W. B. Wu ( Nanya Technology Corp. (Taiwan) )
F. Y. Chen ( Nanya Technology Corp. (Taiwan) )
T. Y. Huang ( Nanya Technology Corp. (Taiwan) )
C. L. Shih ( Nanya Technology Corp. (Taiwan) )
J. P. Lin ( Nanya Technology Corp. (Taiwan) )
さらに 5 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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