A study of double exposure process design with balanced performance parameters for line/space applications
- 著者名:
J. Zhu ( Shanghai IC R&D Ctr. (China) ) P. Wu ( NEC Electronics Co., Ltd. (China) ) Q. Wu ( NEC Electronics Co., Ltd. (China) ) H. Ding ( NEC Electronics Co., Ltd. (China) ) X. Li ( NEC Electronics Co., Ltd. (China) ) C. Sun ( NEC Electronics Co., Ltd. (China) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Trans Tech Publications |
SPIE - The International Society of Optical Engineering |
10
国際会議録
A systematic study of the dip in the CD through-pitch curve for low kl processes [6154-143]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Trans Tech Publications |
Society of Photo-optical Instrumentation Engineers |