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A study of double exposure process design with balanced performance parameters for line/space applications

著者名:
J. Zhu ( Shanghai IC R&D Ctr. (China) )
P. Wu ( NEC Electronics Co., Ltd. (China) )
Q. Wu ( NEC Electronics Co., Ltd. (China) )
H. Ding ( NEC Electronics Co., Ltd. (China) )
X. Li ( NEC Electronics Co., Ltd. (China) )
C. Sun ( NEC Electronics Co., Ltd. (China) )
さらに 1 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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