A method for generating assist-features in full-chip scale and its application to contact layers of sub-70nm DRAM devices
- 著者名:
D. Park ( SAMSUNG Electronics Co., Ltd. (South Korea) ) S. Kim ( SAMSUNG Electronics Co., Ltd. (South Korea) ) C. Hwang ( SAMSUNG Electronics Co., Ltd. (South Korea) ) S. Lee ( SAMSUNG Electronics Co., Ltd. (South Korea) ) H. Cho ( SAMSUNG Electronics Co., Ltd. (South Korea) ) J. Moon ( SAMSUNG Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
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Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
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