Integration of a new alignment sensor for advanced technology nodes
- 著者名:
P. Hinnen ( ASML Netherlands B.V. (Netherlands) ) J. Depre ( ASML Japan Co., Ltd. (Japan) ) S. Tanaka ( ASML Japan Co., Ltd. (Japan) ) S. Lim ( ASML Netherlands B.V. (Netherlands) ) O. Brioso ( ASML Netherlands B.V. (Netherlands) ) M. Shahrjerdy ( ASML Netherlands B.V. (Netherlands) ) K. Ishigo ( Toshiba Corp. (Japan) ) T. Kono ( Toshiba Corp. (Japan) ) T. Higashiki ( Toshiba Corp. (Japan) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |