High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches
- 著者名:
R. H. French ( DuPont Co. (USA) ) V. Liberman ( MIT Lincoln Lab (USA) ) H. V. Tran ( DuPont Co. (USA) ) J. Feldman ( DuPont Co. (USA) ) D. J. Adelman ( DuPont Co. (USA) ) R. C. Wheland ( DuPont Co. (USA) ) W. Qiu ( DuPont Co. (USA) ) S. J. McLain ( DuPont Co. (USA) ) O. Nagao ( DuPont K. K. (Japan) ) M. Kaku ( DuPont K. K. (Japan) ) M. Mocella ( DuPont Co. (USA) ) M. K. Yang ( DuPont Co. (USA) ) M. F. Lemon ( DuPont Co. (USA) ) L. Brubaker ( DuPont Co. (USA) ) A. L. Shoe ( DuPont Co. (USA) ) B. Fones ( DuPont Co. (USA) ) B. E. Fischel ( DuPont Co. (USA) ) K. Krohn ( MIT Lincoln Lab (USA) ) D. Hardy ( MIT Lincoln Lab (USA) ) C. Y. Chen ( DuPont-EKC (USA) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |