The random contact hole solutions for future technology nodes

The random contact hole solutions for future technology nodes

著者名:

A. Chen ( ASML Taiwan Ltd. (Taiwan) )

S. Hansen ( ASML US, Inc. (USA) )

M. Moers ( ASML Netherlands B.V. (Netherlands) )

J. Shieh ( ASML Taiwan Ltd. (Taiwan) )

A. Engelen ( ASML Netherlands B.V. (Netherlands) )

K. van I. Schenau ( ASML Netherlands B.V. (Netherlands) )

S. Tseng ( ASML Taiwan Ltd. (Taiwan) )

さらに 2 件

掲載資料名:

Optical microlithography XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6520

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

言語:

英語

請求記号:

P63600/6520

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046827
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2007 : 20th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.02

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