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Extending immersion lithography to the 32-nm node

著者名:
S. Warrick ( Freescale Semiconductor (France) )
W. Conley ( Freescale Semiconductor (France) )
V. Farys ( ST Microelectronics (France) )
M. Benndorf ( NXP Semiconductors (France) )
J. Gemmink ( NXP Semiconductors (France) )
Y. Trouiller ( ST Microelectronics (France) )
J. Belledent ( NXP Semiconductors (France) )
D. Jovanovic ( Freescale Semiconductor (France) )
P. Gouraud ( ST Microelectronics (France) )
さらに 4 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
巻:
6520
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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