Extending immersion lithography to the 32-nm node

Extending immersion lithography to the 32-nm node

著者名:

S. Warrick ( Freescale Semiconductor (France) )

W. Conley ( Freescale Semiconductor (France) )

V. Farys ( ST Microelectronics (France) )

M. Benndorf ( NXP Semiconductors (France) )

J. Gemmink ( NXP Semiconductors (France) )

Y. Trouiller ( ST Microelectronics (France) )

J. Belledent ( NXP Semiconductors (France) )

D. Jovanovic ( Freescale Semiconductor (France) )

P. Gouraud ( ST Microelectronics (France) )

さらに 4 件

掲載資料名:

Optical microlithography XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6520

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466396 [0819466395]

言語:

英語

請求記号:

P63600/6520

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046827
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2007 : 20th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.02

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1 国際会議録 Integrating immersion lithography in 45-nm logic manufacturing M. Benndorf, S. Warrick, W. Conley, D. Cruau, D. DeSimone, K. Mestadi, V. Farys, J. Gemmink SPIE - The International Society of Optical Engineering	7 国際会議録 Investigation on immersion defectivity root cause V. Farys, S. Gaugiran, D. Cruau, K. Mestadi, S. Warrick, M. Benndorf, R. Feilleux, C. Sourd SPIE - The International Society of Optical Engineering
2 国際会議録 Immersion lithography robustness for the C065 node [6154-07] Warrick, S., Morton, R., Mauri, A., Chapon, J. D, Belledent, J., Conley, W., Barr, A., Lucas, K., Monget, C., Plantier, … SPIE - The International Society of Optical Engineering	8 国際会議録 Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169] Borjon, A., Belledent, J., Trouiller, Y., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. C., Rody, Y., Gardin, G., … SPIE - The International Society of Optical Engineering
3 国際会議録 Resist component leaching in 193-nm immersion lithography Chapon, J.-D., Chaton, C., Gouraud, P., Broekaart, M., Warrick, S., Guilmeau, I., Trauiller, Y., Belledent, J. SPIE - The International Society of Optical Engineering	9 国際会議録 OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes F. Sundermann, Y. Trouiller, J. Urbani, C. Couderc, J. Belledent, A. Borjon, F. Foussadier, C. Gardin, L. LeCam, Y. … SPIE - The International Society of Optical Engineering
4 国際会議録 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner Y. Trouiller, V. Farys, A. Borjon, J. Belledent, C. Couderc, F. Sundermann, J. Urbani, Y. Rody, C. Gardin, J. Planchot, … SPIE - The International Society of Optical Engineering	10 国際会議録 3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node M. Saied, F. Foussadier, J. Belledent, Y. Trouiller, I. Schanen Society of Photo-optical Instrumentation Engineers
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6 国際会議録 Early look into device level imaging with beyond water immersion W. Conley, S. Warrick, C. Garza, P. Goirand, J. Gemmink, D. V. Steenwinckel SPIE - The International Society of Optical Engineering	12 国際会議録 Reflection control for immersion lithography at 45/32-nm nodes W.-J. Tseng, R.-H. Hsu, S. H. Hou, T.-H. Tseng, B. Lin Society of Photo-optical Instrumentation Engineers

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