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Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

著者名:
O. Kritsun ( Advanced Micro Devices, Inc. (USA) )
B. L. Fontaine ( Advanced Micro Devices, Inc. (USA) )
R. Sandberg ( Advanced Micro Devices, Inc. (USA) )
A. Acheta ( Advanced Micro Devices, Inc. (USA) )
H. J. Levinson ( Advanced Micro Devices, Inc. (USA) )
K. Lensing ( Advanced Micro Devices, Inc. (USA) )
M. Dusa ( ASML MaskTools Inc. (USA) )
J. Hauschild ( ASML MaskTools Inc. (USA) )
A. Pici ( ASML MaskTools Inc. (USA) )
C. Saravanan ( Nanometrics Inc. (USA) )
K. Primak ( Nanometrics Inc. (USA) )
R. Korlahalli ( Nanometrics Inc. (USA) )
S. Nirmalgandhi ( Nanometrics Inc. (USA) )
さらに 8 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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