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Issues and challenges of double patterning lithography in DRAM

著者名:
S. Kim ( Hynix Semiconductor Inc. (South Korea) )
S. Koo ( Hynix Semiconductor Inc. (South Korea) )
J. Choi ( Hynix Semiconductor Inc. (South Korea) )
Y. Hwang ( Hynix Semiconductor Inc. (South Korea) )
J. Park ( Hynix Semiconductor Inc. (South Korea) )
E. Kang ( Hynix Semiconductor Inc. (South Korea) )
C. Lim ( Hynix Semiconductor Inc. (South Korea) )
S. Moon ( Hynix Semiconductor Inc. (South Korea) )
J. Kim ( Hynix Semiconductor Inc. (South Korea) )
さらに 4 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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