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Integrating immersion lithography in 45-nm logic manufacturing

著者名:
M. Benndorf ( NXP Semiconductors (France) )
S. Warrick ( Freescale Semiconductor, Inc. (France) )
W. Conley ( Freescale Semiconductor, Inc. (France) )
D. Cruau ( Freescale Semiconductor, Inc. (France) )
D. DeSimone ( ST Microelectronics (France) )
K. Mestadi ( ST Microelectronics (France) )
V. Farys ( ST Microelectronics (France) )
J. Gemmink ( NXP Semiconductors (France) )
さらに 3 件
掲載資料名:
Optical microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6520
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466396 [0819466395]
言語:
英語
請求記号:
P63600/6520
資料種別:
国際会議録

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