Phenolic molecular glasses as resists for next-generation lithography

Phenolic molecular glasses as resists for next-generation lithography

著者名:

X. Andre ( Cornell Univ. (USA) )

J. K. Lee ( Cornell Univ. (USA) )

A. D. Silva ( Cornell Univ. (USA) )

N. Felix ( Cornell Univ. (USA) )

C. K. Ober ( Cornell Univ. (USA) )

H. B. Cao ( Intel Corp. (USA) )

H. Deng ( Intel Corp. (USA) )

H. Kudo ( Kanagawa Univ. (Japan) )

D. Watanabe ( Kanagawa Univ. (Japan) )

T. Nishikubo ( Kanagawa Univ. (Japan) )

さらに 5 件

掲載資料名:

Advances in resist materials and processing technology XXIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6519

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

言語:

英語

請求記号:

P63600/6519

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046826
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Materials and Processing Technology
回次:	2007 : 24th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.26-2007.02.28

類似資料:

1 国際会議録 Molecular glass resists for next-generation lithography [6153-50] Bratton, D., Ayothi, R., Felix, N., Cao, H., Deng, H., Ober, C. K. SPIE - The International Society of Optical Engineering	7 国際会議録 Novel silicon-containing polymers as photoresist materials for EUV lithography Kwark, Y.-J., Bravo-Vasquez, J.-P., Ober, C.K., Cao, H.B., Deng, H., Meagley, R.P. SPIE-The International Society for Optical Engineering
2 国際会議録 Molecular glass resists for next generation lithography A. De Silva, N. Felix, J. Sha, J.-K. Lee, C. K. Ober Society of Photo-optical Instrumentation Engineers	8 国際会議録 Fluoropolymer resists for 157 nm lithography Vohra, V.R., Liu, X.-Q., Douki, K., Ober, C.K., Conley, W., Zimmerman, P., Miller, D. SPIE-The International Society for Optical Engineering
3 国際会議録 The effect of EUV molecular gloss architecture on the bulk dispersion of a photo-acid generator D. L. VanderHart, A. De Silva, N. Felix, V. M. Prabhu, C. K. Ober Society of Photo-optical Instrumentation Engineers	9 国際会議録 Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO₂ N. M. Felix, A. De Silva, J. Sha, C. K. Ober Society of Photo-optical Instrumentation Engineers
4 国際会議録 Silsesquioxane-based 193 nm bilayer resists: characterization and lithographic evaluation Bravo-Vasquez, J. P., Kwark, Y.-J., Ober, C. K., Cao, H. B., Deng, H. SPIE - The International Society of Optical Engineering	10 国際会議録 Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao, H. Deng Society of Photo-optical Instrumentation Engineers
5 国際会議録 New architectures for high resolution patterning A. De Silva, N. Felix, D. Forman, J. Sha, C. K. Ober Society of Photo-optical Instrumentation Engineers	11 国際会議録 Synthesis and Photochemical Reaction of High-Performance UV-Curing Oligomers Nishikubo, T., Kameyama, A., Kudo, H. American Chemical Society
6 国際会議録 Silicon backbone polymers as EUV resists Bravo-Vasquez, J.P., Kwark, Y.-J., Ober, C.K., Cao, H.B., Deng, H., Meagley, R.P. SPIE - The International Society of Optical Engineering	12 国際会議録 Development of EB lithography system for next generation photomasks T. Komagata, H. Takemura, N. Gotoh, K. Tanaka Society of Photo-optical Instrumentation Engineers

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