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Depth-of-focus (DOF) and line-width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography

著者名:
B. J. Lu ( United Microelectronics Corp. (Taiwan) )
Y. Huang ( United Microelectronics Corp. (Taiwan) )
H. T. Tseng ( United Microelectronics Corp. (Taiwan) )
C. C. Yu ( United Microelectronics Corp. (Taiwan) )
L. Meng ( Air Products and Chemicals, Inc. (USA) )
M. Liao ( Air Products and Chemicals, Inc. (USA) )
M. Legenza ( Air Products and Chemicals, Inc. (USA) )
さらに 2 件
掲載資料名:
Advances in resist materials and processing technology XXIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6519
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
言語:
英語
請求記号:
P63600/6519
資料種別:
国際会議録

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