Spin-on organic hardmask materials in 70nm devices
- 著者名:
C. Oh ( Cheil Industries, Inc. (South Korea) ) D. Uh ( Cheil Industries, Inc. (South Korea) ) D. Kim ( Cheil Industries, Inc. (South Korea) ) J. Lee ( Cheil Industries, Inc. (South Korea) ) H. Yun ( Cheil Industries, Inc. (South Korea) ) I. Nam ( Cheil Industries, Inc. (South Korea) ) M. Kim ( Cheil Industries, Inc. (South Korea) ) K. Yoon ( Cheil Industries, Inc. (South Korea) ) K. Hyung ( Cheil Industries, Inc. (South Korea) ) N. Tokareva ( Cheil Industries, Inc. (South Korea) ) H. Cheon ( Cheil Industries, Inc. (South Korea) ) J. Kim ( Cheil Industries, Inc. (South Korea) ) T. Chang ( Cheil Industries, Inc. (South Korea) ) - 掲載資料名:
- Advances in resist materials and processing technology XXIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6519
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- 言語:
- 英語
- 請求記号:
- P63600/6519
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
国際会議録
Optimization of optical properties of silicon-based anti-reflective spin-on hardmask materials
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |