Self-aligned self-assembled organosilicate line patterns of ~20nm half-pitch from block-copolymer mediated self assembly
- 著者名:
H. Kim ( IBM (USA) ) J. Cheng ( IBM (USA) ) C. Rettner ( IBM (USA) ) O. Park ( IBM (USA) ) R. Miller ( IBM (USA) ) M. Hart ( IBM (USA) ) L. Sundstrom ( IBM (USA) ) Y. Zhang ( IBM (USA) ) - 掲載資料名:
- Advances in resist materials and processing technology XXIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6519
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- 言語:
- 英語
- 請求記号:
- P63600/6519
- 資料種別:
- 国際会議録
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