Material design of negative-tone polyphenol resist for EUV and EB lithography

Material design of negative-tone polyphenol resist for EUV and EB lithography

著者名:

K. Kojima ( Hitachi, Ltd. (Japan) )
S. Mori ( Hitachi ULSI Systems. Co., Ltd. (Japan) )
D. Shiono ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
H. Hada ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
J. Onodera ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )

掲載資料名:

Advances in resist materials and processing technology XXIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6519

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

言語:

英語

請求記号:

P63600/6519

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046826
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Materials and Processing Technology
回次:	2007 : 24th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.26-2007.02.28

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