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Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

著者名:
T. Wallow ( Advanced Micro Devices, Inc. (USA) )
A. Acheta ( Advanced Micro Devices, Inc. (USA) )
Y. Ma ( Advanced Micro Devices, Inc. (USA) )
A. Pawloski ( Affymetrix, Corp. (USA) )
S. Bell ( Spansion LLC (USA) )
B. Ward ( Spansion LLC (USA) )
C. Tabery ( Advanced Micro Devices, Inc. (USA) )
B. L. Fontaine ( Advanced Micro Devices, Inc. (USA) )
R. Kim ( Advanced Micro Devices, Inc. (USA) )
S. McGowan ( Advanced Micro Devices, Inc. (USA) )
H. J. Levinson ( Advanced Micro Devices, Inc. (USA) )
さらに 6 件
掲載資料名:
Advances in resist materials and processing technology XXIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6519
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
言語:
英語
請求記号:
P63600/6519
資料種別:
国際会議録

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