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Scatterometry on pelliclized masks: an option for wafer fabs

著者名:
E. Gallagher ( IBM Corp. (USA) )
C. Benson ( IBM Corp. (USA) )
M. Higuchi ( Toppan Electronics Inc. (USA) )
Y. Okumoto ( Toppan Electronics Inc. (USA) )
M. Kwon ( Timbre Technologies, Inc. (USA) )
S. Yedur ( Timbre Technologies, Inc. (USA) )
S. Li ( Timbre Technologies, Inc. (USA) )
S. Lee ( Nanometrics, Inc. (USA) )
M. Tabet ( Nanometrics, Inc. (USA) )
さらに 4 件
掲載資料名:
Metrology, inspection, and process control for microlithography XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6518
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
言語:
英語
請求記号:
P63600/6518
資料種別:
国際会議録

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