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Zero-order imaging of device-sized overlay targets using scatterfield microscopy

著者名:
  • B. M. Barnes ( National Institute of Standards and Technology (USA) )
  • L. P. Howard ( National Institute of Standards and Technology (USA) and Precera, Inc. (USA) )
  • J. Jun ( National Institute of Standards and Technology (USA) )
  • P. Lipscomb ( ISMI SEMATECH (USA) )
  • R. M. Silver ( National Institute of Standards and Technology (USA) )
掲載資料名:
Metrology, inspection, and process control for microlithography XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6518
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
言語:
英語
請求記号:
P63600/6518
資料種別:
国際会議録

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