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Meeting overlay requirements for future technology nodes with in-die overlay metrology

著者名:
B. Schulz ( AMD Saxony LLC and Co. KG (Germany) )
R. Seltmann ( AMD Fab36 LLC and Co. KG (Germany) )
J. Busch ( AMD Saxony LLC and Co. KG (Germany) )
F. Hempel ( AMD Fab36 LLC and Co. KG (Germany) )
E. Cotte ( AMTC GmbH and Co. KG (Germany) )
B. Alles ( Univ. of Technology Munich (Germany) )
さらに 1 件
掲載資料名:
Metrology, inspection, and process control for microlithography XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6518
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
言語:
英語
請求記号:
P63600/6518
資料種別:
国際会議録

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