Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

著者名:

C. S. Saravanan ( Nanometrics, Inc. (USA) )

S. Nirmalgandhi ( Nanometrics, Inc. (USA) )

O. Kritsun ( AMD (USA) )

A. Acheta ( AMD (USA) )

R. Sandberg ( AMD (USA) )

B. L. Fontaine ( AMD (USA) )

H. J. Levinson ( AMD (USA) )

K. Lensing ( AMD (USA) )

M. Dusa ( ASML US, Inc. (USA) )

J. Hauschild ( ASML US, Inc. (USA) )

A. Pici ( ASML US, Inc. (USA) )

さらに 6 件

掲載資料名:

Metrology, inspection, and process control for microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6518

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

言語:

英語

請求記号:

P63600/6518

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046825
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2007 : 21st
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.26-2007.03.01

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2 国際会議録 Study of the influence of substrate topography on the focusing performance of advanced lithography scanners Fontaine, B.M.L., Hauschild, J., Dusa, M.V., Acheta, A., Apelgren, E.M., Boonman, M., Krist, J., Khathuria, A., … SPIE-The International Society for Optical Engineering	8 国際会議録 The transfer of photoresist LER through etch [6153-45] Pawloski, A. R., Acheta, A., Bell, S., La Fontaine, B., Wallow, T., Levinson, H. J. SPIE - The International Society of Optical Engineering
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