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Characteristics and prevention of pattern collapse in EUV lithography

著者名:
W. Chang ( Hanyang Univ. (South Korea) )
E. Kim ( Hanyang Univ. (South Korea) )
Y. Kang ( Hanyang Univ. (South Korea) )
S. Park ( Hanyang Univ. (South Korea) )
C. Lim ( Hynix Semiconductor Inc. (South Korea) )
K. Won ( Seoul National Univ. (South Korea) )
J. Kim ( Seoul National Univ. (South Korea) )
H. Oh ( Hanyang Univ. (South Korea) )
さらに 3 件
掲載資料名:
Emerging lithographic technologies XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6517
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466365 [0819466360]
言語:
英語
請求記号:
P63600/6517
資料種別:
国際会議録

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