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Focused ion beam nano patterning for fabrications of III-nitride light emitting diodes

著者名:
M. Y. Kim ( Samsung Electro-Mechanics (South Korea) )
Y. C. Park ( Samsung Electro-Mechanics (South Korea) )
S. S. Hong ( Samsung Electro-Mechanics (South Korea) )
B. K. Kim ( Samsung Electro-Mechanics (South Korea) )
D. W. Kim ( Samsung Electro-Mechanics (South Korea) )
D. Y. Lee ( Samsung Electro-Mechanics (South Korea) )
さらに 1 件
掲載資料名:
Emerging lithographic technologies XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6517
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466365 [0819466360]
言語:
英語
請求記号:
P63600/6517
資料種別:
国際会議録

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