EUV lithography program at IMEC

EUV lithography program at IMEC

著者名:

A. M. Goethals ( IMEC (Belgium) )

R. Jonckheere ( IMEC (Belgium) )

G. F. Lorusso ( IMEC (Belgium) )

J. Hermans ( IMEC (Belgium) )

F. V. Roey ( IMEC (Belgium) )

A. Myers ( Intel Corp. (USA) )

M. Chandhok ( Intel Corp. (USA) )

I. Kim ( Samsung Electronics (South Korea) )

A. Niroomand ( Micron Technology (USA) )

F. Iwamoto ( Matsushita Electric Industrial Co., Ltd. (Japan) )

N. Stepanenko ( Qimonda (USA) )

R. Gronheid ( IMEC (Belgium) )

B. Baudemprez ( IMEC (Belgium) )

K. Ronse ( IMEC (Belgium) )

さらに 9 件

掲載資料名:

Emerging lithographic technologies XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6517

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

言語:

英語

請求記号:

P63600/6517

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046824
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2007 : 11th
会議開催地:	San Jose, CA, USA
会議開催年:	2007.02.27-2007.03.01

類似資料:

1 国際会議録 Full field EUV lithography turning into a reality at IMEC R. Jonckheere, G. F. Lorusso, A. M. Goethals, J. Hermans, B. Baudemprez, A. Myers, I. Kim, A. Niroomand, F. Iwamoto, N. … SPIE - The International Society of Optical Engineering	7 国際会議録 Dependence of EUV mask printing performance on blank architecture R. Jonckheere, Y. Hyun, F. Iwamoto, B. Baudemprez, J. Hermans Society of Photo-optical Instrumentation Engineers
2 国際会議録 Imaging performance of the EUV alpha demo tool at IMEC G. F. Lorusso, J. Hermans, A. M. Goethals, B. Baudemprez, F. Van Roey Society of Photo-optical Instrumentation Engineers	8 国際会議録 Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm Goethals,A.M., Vertommen,J., Roey,F.Van, Yen,A., Tritchkov,A., Ronse,K., Jonckheere,R., hove,L.Van den SPIE-The International Society for Optical Engineering
3 国際会議録 Investigation of mask defectivity in full field EUV lithography R. Jonckheere, F. Iwamoto, G. F. Lorusso, A. M. Goethals, K. Ronse Society of Photo-optical Instrumentation Engineers	9 国際会議録 157-nm photoresist process optimization for a full-field scanner Light, S., Stepanenko, N., Gronheid, R., Van Roey, F., Van den Heuvel, D., Goethals, A.-M. SPIE - The International Society of Optical Engineering
4 国際会議録 Status 157-nm lithography development at IMEC Ronse, K.G., Bisschop, P.D., Eliat, A., Goethals, A.M., Hermans, J., Jonckheere, R., Heuvel, D.V.D., Roey, F.V., Beckx, … SPIE-The International Society for Optical Engineering	10 国際会議録 193-nm lithography on a full-field scanner Goethals,A.-M., Pollers,I., Jaenen,P., Roey,F.Van, Ronse,K., Heskamp,B., Davies,G. SPIE - The International Society for Optical Engineering
5 国際会議録 Full field EUV lithography: lessons learned on EUV ADT imaging, EUV resist, and EUV reticles E. Hendrickx, A. M. Goethals, A. Niroomand, R. Jonckheere, F. Van Roey Society of Photo-optical Instrumentation Engineers	11 国際会議録 Status of ArF lithography for the 130-nm technology node Ronse,K., Vandenberghe,G., Jaenen,P., Delvaux,C., Vangoidsenhoven,D., Roey,F.Van, Pollers,I., Maenhoudt,M., … SPIE - The International Society for Optical Engineering
6 国際会議録 Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future R. Jonckheere, G. F. Lorusso, A. Goethals, K. Ronse, J. Hermans, R. D. Ruyter SPIE - The International Society of Optical Engineering	12 国際会議録 EUV pattern shift compensation strategies T. Schmoeller, I. Kim, G. F. Lorusso, A. Myers, R. Jonckheere Society of Photo-optical Instrumentation Engineers

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