EUV lithography with the Alpha Demo Tools: status and challenges

著者名:

N. Harned ( ASML Wilton (USA) )

M. Goethals ( IMEC (Belgium) )

R. Groeneveld ( ASML Netherlands B.V. (Netherlands) )

P. Kuerz ( Carl Zeiss Semiconductor Manufacturing Technologies AG (Germany) )

M. Lowisch ( Carl Zeiss Semiconductor Manufacturing Technologies AG (Germany) )

H. Meijer ( ASML Netherlands B.V. (Netherlands) )

H. Meiling ( ASML Netherlands B.V. (Netherlands) )

K. Ronse ( IMEC (Belgium) )

J. Ryan ( CNSE/The Univ. at Albany (USA) )

M. Tittnich ( CNSE/The Univ. at Albany (USA) )

H. Voorma ( ASML Netherlands B.V. (Netherlands) )

J. Zimmerman ( ASML Wilton (USA) )

U. Mickan ( ASML Netherlands B.V. (Netherlands) )

S. Lok ( ASML Netherlands B.V. (Netherlands) )

さらに 9 件

掲載資料名:

Emerging lithographic technologies XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6517

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

言語:

英語

請求記号:

P63600/6517

資料種別:

国際会議録