Study of the thermal characteristic of x-ray mask during short-pulsed exposure

Study of the thermal characteristic of x-ray mask during short-pulsed exposure

著者名:

H. Shang ( Shanghai Maritime Univ. (China) )
Y. Wang ( Beijing Univ. of Aeronautics and Astronautics (China) )

掲載資料名:

Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo -Electronic Technology, and Artificial Intelligence : 13-15 October 2006, Beijing, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6357

発行年:

2006

パート:

2

ペーパー番号:

63573M

開始ページ:

63573M-1

終了ページ:

63573M-5

総ページ数:

5

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464521 [081946452X]

言語:

英語

請求記号:

P63600/6357

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046714
シリーズID:	PA00000029
会議名:	International Symposium on Instrumentation and Control Technology
回次:	2006 : 6th
会議開催地:	Beijing, China
会議開催年:	2006.10.13-2006.10.15
論文注記:	63573M ; 6th International Symposium on Instrumentation and Control Technology, 13-15 October 2006, Beijing, China

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