Study of the thermal characteristic of x-ray mask during short-pulsed exposure
- 著者名:
- 掲載資料名:
- Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo -Electronic Technology, and Artificial Intelligence : 13-15 October 2006, Beijing, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6357
- 発行年:
- 2006
- パート:
- 2
- ペーパー番号:
- 63573M
- 開始ページ:
- 63573M-1
- 終了ページ:
- 63573M-5
- 総ページ数:
- 5
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464521 [081946452X]
- 言語:
- 英語
- 請求記号:
- P63600/6357
- 資料種別:
- 国際会議録
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