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Plasma Etching for the Application to Low-K Dielectrics Devices

著者名:
J.W. Lee
H.W. Kim
J.W. Han
M.S. Kim
B.D. Yoo
M.H. Kim
C.H. Lee
C.H. Lim
S.K. Hwang
C. Lee
D.J. Chung
S.G. Park
S.G. Lee
B.H. O
J. Kim
S.P. Chang
S.H. Lee
S.Y. Chai
W.I. Lee
S.E. Park
K. Kim
D.K. Choi
C.W. Chung
さらに 18 件
掲載資料名:
Research trends in contemporary materials science : YUCOMAT VIII : selected papers presented at the 8th Conference of the Yugoslav Materials Research Society, held in Herceg Novi, Montenegro September 4-8, 2006
シリーズ名:
Materials science forum
シリーズ巻号:
555
発行年:
2007
巻:
555
開始ページ:
113
終了ページ:
118
総ページ数:
6
出版情報:
Stafa-Zuerich, Switzerland: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878494415 [0878494413]
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

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