Toward DFM: process worthy design and OPC through verification method using MEEF, TF・MEEF, and MTT [6156-21]
- 著者名:
Kim, I.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Suh, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Jung, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, E. ( Samsung Electronics Co., Ltd. (South Korea) ) Kang, Y.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6156
- 発行年:
- 2006
- 開始ページ:
- 61560L
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461995 [0819461997]
- 言語:
- 英語
- 請求記号:
- P63600/6156
- 資料種別:
- 国際会議録
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