Lithography oriented DfM for 65 nm and beyond [6156-14]

Lithography oriented DfM for 65 nm and beyond [6156-14]

著者名:

Kyoh, S. ( Toshiba Corp.,Semiconductor Co. (Japan) )
Kotani, T. ( Toshiba Corp.,Semiconductor Co. (Japan) )
Kobayashi, S. ( Toshiba Corp.,Semiconductor Co. (Japan) )
Ikeuchi, A. ( Toshiba Corp.,Semiconductor Co. (Japan) )
Inoue, S. ( Toshiba Corp.,Semiconductor Co. (Japan) )

掲載資料名:

Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6156

発行年:

2006

開始ページ:

61560F

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461995 [0819461997]

言語:

英語

請求記号:

P63600/6156

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016431
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Design and process integration for microelectronic manufacturing
回次:	2006 : 4th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.23-2006.02.24

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