CD analysis of advanced photolithography and its impact on critical design structures [6156-12]
- 著者名:
Romero, K. A. ( AMD Fab36 LLC & Co. KG (Germany) ) Seltmann, R. ( AMD Fab36 LLC & Co. KG (Germany) ) Burbach, G. ( AMD Fab36 LLC & Co. KG (Germany) ) Stephan, R. ( AMD Fab36 LLC & Co. KG (Germany) ) Paufler, J. ( AMD Saxony LLC & Co. KG (Germany) ) Greenlaw, D. ( AMD Saxony LLC & Co. KG (Germany) ) - 掲載資料名:
- Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6156
- 発行年:
- 2006
- 開始ページ:
- 61560D
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461995 [0819461997]
- 言語:
- 英語
- 請求記号:
- P63600/6156
- 資料種別:
- 国際会議録
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5
国際会議録
Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
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