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Optimal exposure distances for 3-D optical circuits induced by laser micromachining in LiNb03 crystals [6149-26]

著者名:
Xu, H. ( Northwestern Poly technical Univ. (China) )
Zhang, P. ( Northwestern Poly technical Univ. (China) )
Zhao, J. ( Northwestern Poly technical Univ. (China) )
Sun, Y. ( Xi’an Jiaotong Univ. (China) )
Yang, D. ( Northwestern Poly technical Univ. (China) )
Ye, Z. ( Northwestern Poly technical Univ. (China) )
Gao, Y. ( Northwestern Poly technical Univ. (China) )
さらに 2 件
掲載資料名:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6149
発行年:
2006
開始ページ:
61490Q
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461889 [0819461881]
言語:
英語
請求記号:
P63600/6149
資料種別:
国際会議録

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