Gray scaling in high performance mask making [5853-94]

Gray scaling in high performance mask making [5853-94]

著者名:

Martinsson, H.
Sandstrom, T. ( Micronic Laser Systems AB (Sweden) )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5853

発行年:

2005

パート:

2

開始ページ:

1031

終了ページ:

1043

総ページ数:

13

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

言語:

英語

請求記号:

P63600/5853

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

類似資料:

1 国際会議録 Rasterizing for SLM-based mask making and maskless lithography Martinsson, H., Sandstrom, T. SPIE - The International Society of Optical Engineering	7 国際会議録 Interaction and balance of mask write time and design RET strategies [5853-44] Zhang, Y., Gray, R., Nakagawa, O. S., Gupta, P., Kamberian, H., Xiao, G., Cottle, R., Progler, C. SPIE - The International Society of Optical Engineering
2 国際会議録 Gray scaling in high performance optical pattern generators [5992-30] Martinsson, H., Sandstrom, T., Rockwell, B. SPIE - The International Society of Optical Engineering	8 国際会議録 Making high-performance scattering-bar OPC masks with vector-scan,variable-shaped e-beam,and raster-scan laser mask writers Lu,H.H., Hwang,R., Lee,V., Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering
3 国際会議録 RET for optical maskless lithography Sandstrom, T., Martinsson, H. SPIE - The International Society of Optical Engineering	9 国際会議録 Stencil pattern accuracy of EPL masks [5853-77] Sugimura, H., Yamazaki, T., Susa, T., Negishi, Y., Yoshii, T., Eguchi, H., Tamura, A. SPIE - The International Society of Optical Engineering
4 国際会議録 Transparent corner enhancement scheme for a DUV pattern generator Martinsson, H., Hellgren, J., Eriksson, N., Bjuggren, M., Sandstrom, T. SPIE-The International Society for Optical Engineering	10 国際会議録 Sources and scaling laws for LER and LWR T. Sandstrom, C. Rydberg SPIE - The International Society of Optical Engineering
5 国際会議録 A high-end mask writer using a spatial light modulator (Invited Paper) Ljungblad, U.B., Askebjer, P., Karlin, T., Sandstrom, T., Sjoberg, H. SPIE - The International Society of Optical Engineering	11 国際会議録 Exploring new high speed mask aware RET verification flows [5853-97] Martin, P., Progler, C. J., Ham, Y.-M., Kasprowicz, B., Gray, R., Wiley, J. N., Yu, Z., Ye, J. SPIE - The International Society of Optical Engineering
6 国際会議録 Printing sub-100-nm random logic patterns using binary masks and synthetic-aperture lithography (SAL) Sandstrom,T. SPIE-The International Society for Optical Engineering	12 国際会議録 Development of positive-tone chemically amplified resist for LEEPL mask making [5853-79] Negishi, Y., Takeshi, K., Yoshii, T., Tanaka, K., Okumoto, Y. SPIE - The International Society of Optical Engineering

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