Advanced photomask repair technology for 65nm lithography (3) [5853-89] | 東京工業大学附属図書館文献データベース

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Advanced photomask repair technology for 65nm lithography (3) [5853-89]

著者名:

Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Adachi, T. ( SII NanoTechnology Inc. (Japan) )

Nishida, N. ( HOYA Co. (Japan) )

さらに 10 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5853

発行年:

2005

パート:

2

開始ページ:

1000

終了ページ:

1008

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

言語:

英語

請求記号:

P63600/5853

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

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1 国際会議録 Advanced photomask repair technology for 65-nm lithography: II Itou, Y., Tanaka, Y., Yoshioka, N., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering	7 国際会議録 Advanced FIB mask repair technology for 100-nm/ArF lithography: II Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, … SPIE-The International Society for Optical Engineering
2 国際会議録 Advanced photomask repair technology for 65 nm lithography (4) [5992-170] Itou, Y., Tanaka, Y., Suga, O., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering	8 国際会議録 Advanced FIB mask repair technology for 100-nm/ArF lithography Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, … SPIE-The International Society for Optical Engineering
3 国際会議録 Advanced photomask repair technology for 65-nm lithography (1) Itou, Y., Tanaka, Y., Yoshioka, N., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Tashiro, J., Suzuki, K., … SPIE - The International Society of Optical Engineering	9 国際会議録 Advanced FIB mask repair technology for ArF lithography: ？ Hagiwara,R., Yasaka,A., Takaoka,O., Kozakai,T., Yabe,S., Koyama,Y., Muramatsu,M., Doi,T., Suzuki,K., Okabe,M., Aita,K., … SPIE-The International Society for Optical Engineering
4 国際会議録 Advanced photomask repair technology for 65-nm lithography [6349-50] Aramaki, F., Kozakai, T., Muramatsu, M., Sugiyama, Y., Koyama, Y., Matsuda, O., Suzuki, K., Okabe, M., Doi, T., … SPIE - The International Society of Optical Engineering	10 国際会議録 FIB mask repair technology for electron projection lithography Yamamoto, Y., Hasuda, M., Suzuki, H., Sato, M., Takaoka, O., Matsumura, H., Matsumoto, N., Iwasaki, K., Hagiwara, R., … SPIE - The International Society of Optical Engineering
5 国際会議録 Advanced photomask repair technology for 65nm lithography (5) [6283-108] Aramaki, F., Kozakai, T., Sugiyama, Y., Muramatsu, M., Koyama, Y., Matsuda, O., Suzuki, K., Okabe, M., Hagiwara, R., … SPIE - The International Society of Optical Engineering	11 国際会議録 Advanced FIB mask repair technology in ArF lithography Hiruta,K., Kubo,S., Morimoto,H., Yasaka,A., Hagiwara,R., Adachi,T., Morikawa,Y., Iwase,K., Hayashi,N. SPIE - The International Society for Optical Engineering
6 国際会議録 Advanced FIB mask repair technology for 90-nm/ArF lithography: III Tanaka, Y., Itou, Y., Yoshioka, N., Hagiwara, R., Yasaka, A., Takaoka, O., Kozakai, T., Koyama, Y., Sawaragi, H., … SPIE - The International Society of Optical Engineering	12 国際会議録 Advanced FIB mask repair technology for ArF lithography: ？ Kubo,S., Hiruta,K., Morimoto,H., Yasaka,A., Hagiwara,R., Adachi,T., Morikawa,Y., Iwase,K., Hayashi,N. SPIE-The International Society for Optical Engineering

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