Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process [5853-61]

Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process [5853-61]

著者名:

Chang, Y. Y.
Wu, Y.-H.
Shih, C.-L.
Lin, J. ( Nanya Technology Corp. (Taiwan) ) , ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Kan, F. ( Inotera Memories Inc. (Taiwan) )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5853

発行年:

2005

パート:

2

開始ページ:

757

終了ページ:

766

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

言語:

英語

請求記号:

P63600/5853

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

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